Department of Chemistry
Colorado State University
Fort Collins, CO 80523
FAX: (970) 491-1801 |
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X-ray Photoelectron and Auger Electron Spectroscopy
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X-ray Diffraction
Handouts from C563C Class
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High Resolution X-ray Scattering from Thin Films and Multilayers,V. Holy, U. Pietsch, T. Baumbach, Springer Tracts in Modern Physics
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Residual Stress Measurements by Diffraction and Interpretation , I.C. Noyan, J.B. Cohen, Springer-Verlag
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High Resolution X-Ray Diffractometry and Topography D. K. Bowen , B. K. Tanner, Taylor and Francis
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Thermal Analysis
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FTIR and Raman
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UV-VIS-NIR Spectroscopy
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Spectroscopic Ellipsometry
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Woollam, John A.; Hilfiker, James N.; Bungay, Corey L.; Synowicki, Ron A.; Tiwald, Thomas E.; Thompson, Daniel W. Spectroscopic ellipsometry from the vacuum ultraviolet to the far infrared. AIP Conference Proceedings (2001), 550 (Characterization and Metrology for ULSI Technology), 511-518.
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Jenkins, T. E. Multiple-angle-of-incidence ellipsometry. Journal of Physics D: Applied Physics (1999), 32(9), R45-R56.
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Vedam, K. Spectroscopic ellipsometry: a historical overview. Thin Solid Films (1998), 313-314 1-9
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Woollam, John A.; Snyder, Paul G. Fundamentals and applications of variable angle spectroscopic ellipsometry. Materials Science & Engineering, B: Solid-State Materials for Advanced Technology (1990), B5(2), 279-83.
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Collins, Robert W.; Kim, Yeon Taik. Ellipsometry for thin-film and surface analysis. Analytical Chemistry (1990), 62(17), 887A-890A, 893A-900A.
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Quantum Design Service Notes
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